Physics of Fluids - Publications

Engulfment control of platinum nanoparticles into oxidized silicon substrates for fabrication of dense solid-state nanopore arrays

Open Access
Nanotechnology 30, 065301 (2019)

Authors

	Hai Le The
	Corentin Tregouet
	Michael Kappl
	Maren Müller
	Katrin Kirchhoff
	Detlef Lohse
	Albert van den Berg
	Mathieu Odijk
	Jan C. T. Eijkel

BibTeΧ

@article{Le_The_2018,
	doi = {10.1088/1361-6528/aaf114},
	url = {https://doi.org/10.1088%2F1361-6528%2Faaf114},
	year = 2018,
	month = {dec},
	publisher = {{IOP} Publishing},
	volume = {30},
	number = {6},
	pages = {065301},
	author = {Hai Le-The and Corentin Tregouet and Michael Kappl and Maren Müller and Katrin Kirchhoff and Detlef Lohse and Albert van den Berg and Mathieu Odijk and Jan C T Eijkel},
	title = {Engulfment control of platinum nanoparticles into oxidized silicon substrates for fabrication of dense solid-state nanopore arrays},
	journal = {Nanotechnology},
	annote = {We found that platinum (Pt) nanoparticles, upon annealing at high temperature of 1000 °C, are engulfed into amorphous fused-silica or thermal oxide silicon substrates. The same phenomenon was previously published for gold (Au) nanoparticles. Similar to the Au nanoparticles, the engulfed Pt nanoparticles connect to the surface of the substrates through conical nanopores, and the size of the Pt nanoparticles decreases with increasing depth of the nanopores. We explain the phenomena as driven by the formation of platinum oxide by reaction of the platinum with atmospheric oxygen, with platinum oxide evaporating to the environment. We found that the use of Pt provides much better controllability than the use of Au. Due to the high vapor pressure of platinum oxide, the engulfment of the Pt nanoparticles into oxidized silicon (SiO2) substrates is faster than of Au nanoparticles. At high temperature annealing we also find that the aggregation of Pt nanoparticles on the substrate surface is insignificant. As a result, the Pt nanoparticles are uniformly engulfed into the substrates, leading to an opportunity for patterning dense nanopore arrays. Moreover, the use of oxidized Si substrates enables us to precisely control the depth of the nanopores since the engulfment of Pt nanoparticles stops at a short distance above the SiO
x
/Si interface. After subsequent etching steps, a membrane with dense nanopore through-holes with diameters down to sub-30 nm is obtained. With its simple operation and high controllability, this fabrication method provides an alternative for rapid patterning of dense arrays of solid-state nanopores at low-cost.}
}